Product Introduction
Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors such as semiconductors, photovoltaics, and advanced battery materials, where maintaining material integrity during high-temperature processing is paramount.
Outstanding Features of Graphite Target
High Thermal Stability
It maintains stable performance in high-power, high-temperature sputtering processes, ensuring uniform film deposition.
Low Thermal Expansion Coefficient
It is dimensionally stable under temperature changes, reducing deposition stress and enhancing the film's density and adhesion.
Excellent Electrical Conductivity
Graphite targets have good electrical conductivity, making them suitable for the preparation of electronic devices, functional films, and conductive layers.
Wide Applications of Graphite Target
Semiconductor Manufacturing
Graphite targets are used for preparing conductive films, carbon barrier layers, and interconnect layers, ensuring high performance and stability of devices.
Optical Component Manufacturing
Used for preparing carbon films, anti-reflection coatings, and infrared absorption films, widely applied in optical components, laser devices, and infrared windows.
Photovoltaic Industry
Used in photovoltaic cell back electrodes, fuel cell carbon layers, and supercapacitor conductive layers, enhancing energy conversion efficiency and device lifespan.
Aerospace
Films deposited by graphite targets can serve as high-temperature protective coatings, improving heat resistance and wear resistance.
Technical characteristics
Purity
99.99%
Relative density
≥99%
Application scenarios
Semiconductor Manufacturing
Optical Device Manufacturing
Photovoltaic Industry
Aerospace
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