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MoNb Target

APG

Metal Target

Molybdenum Niobium Target (MoNb)

High Temperature Resistance
High Electrical Conductivity
High Hardness
Good Density

Product Introduction

Engineered from high-purity powders this alloy combines the exceptional hardness, thermal resilience, and high melting point characteristic of molybdenum with the superior electrical conductivity and chemical inertness of niobium. MoNb targets are used to prepare wear-resistant, high-temperature-resistant, and corrosion-resistant functional films, with applications in semiconductor, optical, energy, and high-end decorative coating fields. The MoNb films produced by sputtering have high density, good adhesion, and stable physical and chemical properties.

Core Advantages of MoNb Target

  • High Temperature Resistance

    The molybdenum content provides a high melting point and good thermal stability, allowing the film to remain stable during high-temperature sputtering processes, suitable for high-power deposition.

  • Strong Corrosion Resistance

    Niobium enhances film resistance against acid, alkali, and oxidation environments, extending the lifespan of the films and devices.

  • Good Electrical Conductivity

    The alloy film has stable electrical conductivity, making it suitable for use in electronic devices, functional films, and transparent conductive films.

  • High Hardness and Wear Resistance

    MoNb films have high hardness and wear resistance, suitable for protective coatings and high-end decorative coatings, enhancing durability.

  • Good Film Density

    Sputtered films are uniform having strong adhesion which ensure film stability in diverse applications.


Main Applications of MoNb Target

  1.  Semiconductor Manufacturing
    MoNb targets can be used to prepare conductive layers, interconnect layers, or shielding layers, providing stable electrical performance and long-term reliability for semiconductor devices and electronic components.

  2. Display Panels

    Used to deposit functional films such as transparent electrode auxiliary layers, gate electrodes, or interconnect lines in LCD, OLED, and Mini/Micro LED display panels. Core advantages: good flexibility, strong interface adhesion with transparent conductive layers (ITO/IZO), and high sputtering uniformity.

  3. Photovoltaic Industry

    Mainly used for back electrodes or conductive backplates in thin-film photovoltaic cells (such as CIGS, CdTe cells). Core advantages: high temperature resistance, resistance to photovoltaic electrolyte corrosion, and low contact resistance.

  4. Aerospace
    MoNb films have high hardness, high-temperature resistance, and corrosion resistance, making them suitable for surface protection of aerospace and high-temperature industrial equipment, extending the lifespan of critical components.


Technical characteristics

  • Purity

    Purity

    99.9%-99.99%

  • Proportioning

    Proportioning

    Customizable Ratio

Application Fields

  • Semiconductor Manufacturing

    Semiconductor Manufacturing

  • Display Panels

    Display Panels

  • Photovoltaic Industry

    Photovoltaic Industry

  • Aerospace

    Aerospace

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