Product Introduction
Chromium, a silver-white transition metal, is a cornerstone of modern materials science. Distinguished by its exceptional hardness and superior corrosion resistance, it is indispensable in the production of stainless steel, high-strength alloys, and advanced electroplating. Within the fields of thin-film technology and microelectronics, chromium sputtering targets are essential for achieving high film uniformity and quality, providing the critical reliability required for high-precision electronic component fabrication.
Chromium rotary targets are manufactured via an advanced thermal spraying process, achieving a relative density of 95%. This production method ensures high efficiency and a shortened lead time, providing a significant cost advantage for large-scale operations. These targets can be produced in the lengths of up to 4,000 mm
Planar targets are manufactured through a rigorous hot-pressing and sintering bonding process, resulting in ultra-low oxygen content and exceptional film brightness. Dimensions are customizable tailored to specific equipment requirements and customer specifications.
Excellent Properties of Chromium Target
High Hardness, High Adhesion
The deposited chromium film exhibits superior hardness and exceptional adhesion, providing a robust surface with outstanding wear resistance. This high-performance profile ensures the coating remains resilient under demanding mechanical stress.
Strong corrosion resistance
Chromium film has good resistance to oxidation and acid-base environments, making it suitable for harsh working conditions.
Good Electrical Conductivity and Thermal Stability
Widely used in functional film materials for electrical components and high-temperature environments.
Wide Applications of Chromium Target
Semiconductor Manufacturing
Decorative Coatings
Technical Characteristics
Purity
99.5%-99.95%
Density
7.19g/cm³
Application Fields
Semiconductor Manufacturing
Decorative Coatings
Contact Us
